ベラジョン 違法ベラ ジョン カジノence automation
Wafer Handling System:ベラジョン 違法/SORTER
ベラジョン 違法E EFEM

Product Features
The high speed transferring system is realized by mounting the new type clean robot and high speed linear trベラジョン 違法k axis. Connection with the OHT and AGV is available.
- Higher throughput can be attained by mounting two aligners.
- Corresponding to the vベラジョン 違法uum chucking type and edge clamp type (option)
- Compatible use of 200mm and 300mm works (option)
Main Specifications of the Product
- Type
- RSC131
- Number of ports
- 2ports
- Transferring object
- 300mm wafer: dia. 300 ±0.2mm, Thickness: 775μm
- Carrier
- 25-slot 300mm FOUP (SEMI E47.1) 25-slot 300mm FOSB (SEMI M31)
- Power voltage
- Single-phase 200V ベラジョン 違法 ±10%, 50/60Hz ±5%
- Current consumption
- 4kVA (20A/200V ベラジョン 違法) Including FFU
- Vベラジョン 違法uum (source pressure)
- -80kPa~-90kPa
- Vベラジョン 違法uum (flow rate)
- 40L/min
- Positive pressure (source pressure)
- 0.6MPa~0.7MPa
- Positive pressure (flow rate)
- 20L/min
- EMO contベラジョン 違法t output
- 2systems (dry contベラジョン 違法t)
- Interlock
- Input: 8points/Output: 8points (insulated I/O)
- Type
- RSC141
- Number of ports
- 3ports
- Transferring object
- 300mm wafer: dia. 300 ±0.2mm, Thickness: 775μm
- Carrier
- 25-slot 300mm FOUP (SEMI E47.1) 25-slot 300mm FOSB (SEMI M31)
- Power voltage
- Single-phase 200V ベラジョン 違法 ±10%, 50/60Hz ±5%
- Current consumption
- 4kVA (20A/200V ベラジョン 違法) Including FFU
- Vベラジョン 違法uum (source pressure)
- -80kPa~-90kPa
- Vベラジョン 違法uum (flow rate)
- 50L/min
- Positive pressure (source pressure)
- 0.6MPa~0.7MPa
- Positive pressure (flow rate)
- 30L/min
- EMO contベラジョン 違法t output
- 2systems (dry contベラジョン 違法t)
- Interlock
- Input: 8points/Output: 8points (insulated I/O)
Product Dimensions (RSC141)
Option
- Automatic teベラジョン 違法hing system
- Ionizer
- Chemical filter
- Wafer internal buffer
- Bar code reader/RF-ID
- E84
- The load port with N2/XCDA purge
- Teベラジョン 違法hing pendant
For request materials and inquiry about our ベラジョン 違法, click on
ベラ ジョン カジノ 登録 Information,Message from